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PEE-A Intern - CMP

The Programme 

Micron’s vision is to transform how the world uses information to enrich life for all. ​ Join an inclusive team focused on one thing: using our expertise in the relentless pursuit of innovation for customers and partners. The solutions we create help make everything from virtual reality experiences to breakthroughs in neural networks possible. We do it all while committing to integrity, sustainability, and giving back to our communities. Because doing so can spark the very innovation we are pursuing.   
 
Title: - Evaluation of Dual spray bar in Chemical Mechanical Polishing tool. 
 
Description - The single spray bar in the Chemical Mechanical Polishing tool is used to dry the wafer after polish, and wafer on the current process is liable to surface defects after drying. Using a dual spray bar can help to achieve a drier wafer surface and reduce the surface defects on the wafer. 
 
Scope - Perform process characterization for Chemical Mechanical Polish tool fitted with the dual spray bar.  Collaborate with the process engineers to develop and optimize the process conditions for it.  
 
Student will be able to learn how to use statistical tools, fab-specific applications and software for operations, datamining; as well as perform Design of Experiment (DOE) to optimize the process/equipment. 
 
Deliverable - Characterization data on the dual spray bar and develop Best Known Method to reduce surface defects on this tool type. 

Closed 10 months ago
Closed 10 months ago
  • Job type:Internships
  • Disciplines:

    All Disciplines

  • Citizenships:

  • Locations:

    Singapore (Singapore)

  • Closing Date:13th Jan 2021, 6:00 pm

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